Molecular dynamics simulation of Cu and Ar ion sputtering of Cu (111) surfaces.
| Autor: | Kress, J. D., Hanson, D. E., Voter, A. F., Liu, C. L., Liu, X.-Y., Coronell, D. G. |
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| Zdroj: | Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; 1999, Vol. 17 Issue 5, p2819-2825, 7p |
| Databáze: | Complementary Index |
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