Kinetics and mechanism of plasma oxidation of tantalum silicides.
| Autor: | Gómez-San Román, R., Pérez-Casero, R., Perrière, J., Enard, J. P., Martínez-Duart, J. M. |
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| Zdroj: | Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; 1995, Vol. 13 Issue 1, p54-62, 9p |
| Databáze: | Complementary Index |
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