X-ray mask fogging by electrons backscattered beneath the membrane @f| .
| Autor: | Christenson, K. K., Viswanathan, R. G., Hohn, F. J. |
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| Zdroj: | Journal of Vacuum Science & Technology: Part B-Microelectronics Processing & Phenomena; 1990, Vol. 8 Issue 6, p1618-1623, 6p |
| Databáze: | Complementary Index |
| Externí odkaz: |
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