The first x-ray lithography beamline at Hefei National Synchrotron Radiation Laboratory.

Autor: Qian, Shinan, Li, Guihe, Liu, Zewen, Chen, Qianhong, Jiang, Dikui, Liu, Wanpo, Kan, Ya, Su, Yonggang
Zdroj: Journal of Vacuum Science & Technology: Part B-Microelectronics Processing & Phenomena; 1990, Vol. 8 Issue 6, p1524-1528, 5p
Databáze: Complementary Index