The first x-ray lithography beamline at Hefei National Synchrotron Radiation Laboratory.
Autor: | Qian, Shinan, Li, Guihe, Liu, Zewen, Chen, Qianhong, Jiang, Dikui, Liu, Wanpo, Kan, Ya, Su, Yonggang |
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Zdroj: | Journal of Vacuum Science & Technology: Part B-Microelectronics Processing & Phenomena; 1990, Vol. 8 Issue 6, p1524-1528, 5p |
Databáze: | Complementary Index |
Externí odkaz: |