Exposure of ultrathin polymer resists with the scanning tunneling microscope.
Autor: | Zhang, H., Hordon, L. S., Kuan, S. W. J., Maccagno, P., Pease, R. F. W. |
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Zdroj: | Journal of Vacuum Science & Technology: Part B-Microelectronics Processing & Phenomena; 1989, Vol. 7 Issue 6, p1717-1722, 6p |
Databáze: | Complementary Index |
Externí odkaz: |