Exposure of ultrathin polymer resists with the scanning tunneling microscope.

Autor: Zhang, H., Hordon, L. S., Kuan, S. W. J., Maccagno, P., Pease, R. F. W.
Zdroj: Journal of Vacuum Science & Technology: Part B-Microelectronics Processing & Phenomena; 1989, Vol. 7 Issue 6, p1717-1722, 6p
Databáze: Complementary Index