EL3 system for quarter-micron electron beam lithography.
Autor: | Groves, T. R., Pfeiffer, H. C., Newman, T. H., Hohn, F. J. |
---|---|
Zdroj: | Journal of Vacuum Science & Technology: Part B-Microelectronics Processing & Phenomena; 1988, Vol. 6 Issue 6, p2028-2032, 5p |
Databáze: | Complementary Index |
Externí odkaz: |