X-ray sources for microlithography created by laser radiation at λ=0.26 μm.

Autor:	Pépin, H., Alaterre, P., Chaker, M., Fabbro, R., Faral, B., Toubhans, I., Nagel, D. J., Peckerar, M.
Zdroj:	Journal of Vacuum Science & Technology: Part B-Microelectronics Processing & Phenomena; 1987, Vol. 5 Issue 1, p27-32, 6p
Databáze:	Complementary Index
Externí odkaz:	Zobrazit plný text záznamu