| Autor: |
Cheng, Liwei, Fan, Jenyu, Janssen, Douglas, Guo, Dingkai, Chen, Xing, Towner, Fred, Choa, Fow-Sen |
| Předmět: |
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| Zdroj: |
Journal of Electronic Materials; Mar2012, Vol. 41 Issue 3, p506-513, 8p, 3 Color Photographs, 4 Black and White Photographs, 1 Diagram, 1 Graph |
| Abstrakt: |
We investigated the effect of deep-etched mesa sidewall profile and oxide overhang length on the regrowth structural characteristics for buried- heterostructure (BH) quantum cascade lasers (QCLs) grown by metalorganic chemical vapor deposition (MOCVD). The relationship between etched mesa sidewall geometry, oxide overhang length, oxide thickness, and growth uniformity was examined and is extensively discussed. In particular, anomalous growth in the vicinity of the oxide edge resulting from insufficient oxide overhang length was identified and studied. An ideal ratio of mesa height to oxide overhang length between 2.5 and 3.0 is proposed and experimentally justified to yield satisfactory planar regrowths without anomalous growth. Mesas in the [011-] direction with smoothly etched entrant profile yield a higher degree of growth uniformity than mesas in the [011] direction with the re-entrant profile. [ABSTRACT FROM AUTHOR] |
| Databáze: |
Complementary Index |
| Externí odkaz: |
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