EUV-patterning characterization using a 3D mask simulation and field EUV scanner.
| Autor: | Park, Jun-Taek, Hyun, Yoon-Suk, Lim, Chang-Moon, Eom, Tae-Seung, Koo, Sunyoung, Park, Sarohan, Kim, Suk-Kyun, Ban, Keun-Do, Yang, Hyun-Jo, Oh, Chang-Il, Nam, Byung-Ho, Kim, Chang-Reol, Kim, HyeongSoo, Moon, Seung-Chan, Park, Sungki |
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| Zdroj: | Proceedings of SPIE; Nov2009 Part 2, Issue 1, p72711G-72711G-10, 10p |
| Databáze: | Complementary Index |
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