Correlation of experimental and simulated cure-induced photoresist distortions in double patterning.
| Autor: | Wallow, Thomas I., Rayasam, Mahidhar, Yamaguchi, Masanori, Yamada, Yohei, Petrillo, Karen, Yoshimoto, Kenji, Kye, Jongwook, Kim, Ryoung-Han, Levinson, Harry J. |
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| Zdroj: | Proceedings of SPIE; Nov2009, Issue 1, p727309-727309-8, 8p |
| Databáze: | Complementary Index |
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