Photoresist stabilization for double patterning using 172 nm photoresist curing.
| Autor: | Wallow, Thomas I., Dai, Junyan, Szmanda, Charles R., Cervera, Hiram, Truong, Chi, Bekiaris, Nikolaos, Kye, Jong-Wook, Kim, Ryoung-Han, Levinson, Harry J., Mori, Glen |
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| Zdroj: | Proceedings of SPIE; Nov2009 Part 2, Issue 1, p72730D-72730D-10, 10p |
| Databáze: | Complementary Index |
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