Correlation of EUV resist performance metrics in micro-exposure and full-field EUV projection tools.
| Autor: | Wallow, Thomas I., Pierson, Bill, Mizuno, Hiroyuki, Fumar-Pici, Anita, Petrillo, Karen, Anderson, Chris N., Naulleau, Patrick P., Hansen, Steven G., Deng, Yunfei, van Ingen Schenau, Koen, Koay, Chiew-Seng, Ohara, Linda, Han, Sang-In, Watso, Robert, Huli, Lior, Burkhardt, Martin, Wood, Obert, Mallmann, Joerg, Kessels, Bart, Routh, Robert |
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| Zdroj: | Proceedings of SPIE; Nov2009 Part 2, Issue 1, p72733T-72733T-11, 11p |
| Databáze: | Complementary Index |
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