Enhanced layout optimization of sub-45nm standard: memory cells and its effects.
Autor: | Paek, Seung Weon, Jang, Dae Hyun, Park, Joo Hyun, Ha, Naya, Kim, Byung-Moo, Won, Hyo Sig, Choi, Kyu-Myung, Lin, Kuang-Kuo, Klaver, Simon, Malik, Shobhit, Oostindie, Michiel, Driessen, Frank |
---|---|
Zdroj: | Proceedings of SPIE; Nov2009 Part 2, Issue 1, p72751M-72751M-9, 9p |
Databáze: | Complementary Index |
Externí odkaz: |