Using synchrotron light to accelerate EUV resist and mask materials learning.
| Autor: | Naulleau, Patrick, Anderson, Christopher N., Baclea-an, Lorie-Mae, Denham, Paul, George, Simi, Goldberg, Kenneth A., Jones, Gideon, McClinton, Brittany, Miyakawa, Ryan, Mochi, Iacopo, Montgomery, Warren, Rekawa, Seno, Wallow, Tom |
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| Zdroj: | Proceedings of SPIE; Nov2011, Issue 1, p798509-798509-10, 10p |
| Databáze: | Complementary Index |
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