High-power EUV lithography sources based on gas discharges and laser-produced plasmas.
| Autor: | Stamm, Uwe, Ahmad, Imtiaz, Balogh, Istvan, Birner, H., Bolshukhin, D., Brudermann, J., Enke, S., Flohrer, Frank, G″bel, Kai, G÷tze, S., Hergenhan, G., Kleinschmidt, J′rgen, Kl÷pfel, Diethard, Korobotchko, Vladimir, Ringling, Jens, Schriever, Guido, Tran, C. D., Ziener, C. |
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| Zdroj: | Proceedings of SPIE; Nov2003, Issue 1, p119-129, 11p |
| Databáze: | Complementary Index |
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