Development and characterization of new 157-nm photoresists based on advanced fluorinated polymers.
| Autor: | Yamazaki, Tamio, Furukawa, Takamitsu, Itani, Toshiro, Ishikawa, Takuji, Koh, Meiten, Araki, Takayuki, Toriumi, Minoru, Kodani, T., Aoyama, Hirokazu, Yamashita, Tsuneo |
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| Zdroj: | Proceedings of SPIE; Nov2003, Issue 1, p103-112, 10p |
| Databáze: | Complementary Index |
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