Evaluation of SCAA mask technology as a pathway to the 65-nm node.
| Autor: | Beach, James V., Petersen, John S., Maslow, Mark J., Gerold, David J., McCafferty, Diane C. |
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| Zdroj: | Proceedings of SPIE; Nov2003, Issue 1, p1103-1114, 12p |
| Databáze: | Complementary Index |
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