90-nm mask making processes using the positive tone chemically amplified resist FEP171.
| Autor: | Butschke, Joerg, Beyer, Dirk, Constantine, Chris, Dress, Peter, Hudek, Peter, Irmscher, Mathias, Koepernik, Corinna, Krauss, Christian, Plumhoff, Jason, Voehringer, Peter |
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| Zdroj: | Proceedings of SPIE; Nov2003, Issue 1, p344-354, 11p |
| Databáze: | Complementary Index |
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