Optimization of 193-nm single-layer resists through statistical design.
| Autor: | Gabor, Allen H., Dimov, Ognian N., Medina, Arturo N., Neisser, Mark O., Slater, Sydney G., Wang, Ruey H., Houlihan, Francis M., Cirelli, Raymond A., Dabbagh, Gary, Hutton, Richard S., Rushkin, Ilya L., Sweeney, James R., Timko, Allen G., Nalamasu, Omkaram, Reichmanis, Elsa |
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| Zdroj: | Proceedings of SPIE; Nov1999, Issue 1, p221-229, 9p |
| Databáze: | Complementary Index |
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