Chemically amplified positive resist for next-generation photomask fabrication.
| Autor: | Katoh, Kohji, Kasuya, Kei, Arai, Tadashi, Sakamizu, Toshio, Satoh, Hidetoshi, Saitoh, Hidetaka, Hoga, Morihisa |
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| Zdroj: | Proceedings of SPIE; Nov1999, Issue 1, p577-586, 10p |
| Databáze: | Complementary Index |
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