Plasma etching of Cr photomasks: optimization of process conditions and CD control.
| Autor: | Constantine, Chris, Johnson, David J., Westerman, Russell J., Coleman, Thomas P., Faure, Thomas B., Dubuque, Leonard F. |
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| Zdroj: | Proceedings of SPIE; Nov1997, Issue 1, p94-103, 10p |
| Databáze: | Complementary Index |
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