Continuing 193nm optical lithography for 32nm imaging and beyond.
| Autor: | Piscani, Emil C., Ashworth, Dominic, Byers, Jeff, Van Peski, Chris, Zimmerman, Paul, Rice, Bryan J. |
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| Zdroj: | Proceedings of SPIE; Nov2008 Part 2, Issue 1, p69242I-69242I-12, 12p |
| Databáze: | Complementary Index |
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