Binary and attenuated PSM mask evaluation for sub 50nm device development perspective.
| Autor: | Moon, James, Nam, Byoung-Sub, Jeong, Joo-Hong, Kong, Dong-Ho, Nam, Byung-Ho, Yim, Dong-Gyu |
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| Zdroj: | Proceedings of SPIE; Nov2008, Issue 1, p692436-692436-8, 8p |
| Databáze: | Complementary Index |
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