The lithography technology for the 32 nm HP and beyond.

Autor: Dusa, Mircea, Arnold, Bill, Finders, Jo, Meiling, Hans, van Ingen Schenau, Koen, Chen, Alek C.
Zdroj: Proceedings of SPIE; Nov2008, Issue 1, p702810-702810-11, 11p
Databáze: Complementary Index