The lithography technology for the 32 nm HP and beyond.
Autor: | Dusa, Mircea, Arnold, Bill, Finders, Jo, Meiling, Hans, van Ingen Schenau, Koen, Chen, Alek C. |
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Zdroj: | Proceedings of SPIE; Nov2008, Issue 1, p702810-702810-11, 11p |
Databáze: | Complementary Index |
Externí odkaz: |