Study on imaging characterization of ArF high index immersion lithography.

Autor: Park, Sarohan, Park, Jun-Taek, Lee, Kilyoung, Eom, Tae-Seung, Kim, Jin-Soo, Kim, Hyeong-Soo, Moon, Seung-Chan
Zdroj: Proceedings of SPIE; Nov2008 Part 2, Issue 1, p71401K-71401K-8, 8p
Databáze: Complementary Index