Study on imaging characterization of ArF high index immersion lithography.
Autor: | Park, Sarohan, Park, Jun-Taek, Lee, Kilyoung, Eom, Tae-Seung, Kim, Jin-Soo, Kim, Hyeong-Soo, Moon, Seung-Chan |
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Zdroj: | Proceedings of SPIE; Nov2008 Part 2, Issue 1, p71401K-71401K-8, 8p |
Databáze: | Complementary Index |
Externí odkaz: |