Three-dimensional mask effects and source polarization impact on OPC model accuracy and process window.
| Autor: | Saied, M., Foussadier, F., Belledent, J., Trouiller, Y., Schanen, I., Gardin, C., Urbani, J. C., Montgomery, P. K., Sundermann, F., Robert, F., Couderc, C., Vautrin, F., Kerrien, G., Planchot, J., Yesilada, E., Martinelli, C., Wilkinson, B., Borjon, A., Le-Cam, L., Di-Maria, J. L. |
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| Zdroj: | Proceedings of SPIE; Nov2007 Part 2, Issue 1, p65204Q-65204Q-12, 12p |
| Databáze: | Complementary Index |
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