The advanced mask CD MTT control using dry etch process for sub 65 nm tech.
| Autor: | Jo, Sang Jin, Jung, Ho Yong, Lee, Dong Wook, Shin, Jae Cheon, Jun, Jea Young, Ha, Tae Joong, Han, Oscar |
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| Zdroj: | Proceedings of SPIE; Nov2007, Issue 1, p673008-673008-8, 8p |
| Databáze: | Complementary Index |
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