Defect reduction by using a new rinse solution for 193-nm conventional and immersion lithography.
| Autor: | Miyahara, Osamu, Shimoaoki, Takeshi, Naito, Ryoichiro, Yoshihara, Kousuke, Kitano, Junichi |
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| Zdroj: | Proceedings of SPIE; Nov2006 Part 2, Issue 1, p61533K-61533K-13, 13p |
| Databáze: | Complementary Index |
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