Optimizing absorber thickness of attenuating phase-shifting masks for hyper-NA lithography.
| Autor: | Yoshizawa, Masaki, Philipsen, Vicky, Leunissen, Leonardus H. A. |
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| Zdroj: | Proceedings of SPIE; Nov2006 Part 2, Issue 1, p61541E-61541E-8, 8p |
| Databáze: | Complementary Index |
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