Compensation of high-NA mask topography effects by using object modified Kirchhoff model for 65 and 45nm nodes.
| Autor: | Aksenov, Yuri, Zandbergen, Peter, Yoshizawa, Masaki |
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| Zdroj: | Proceedings of SPIE; Nov2006 Part 2, Issue 1, p61541H-61541H-10, 10p |
| Databáze: | Complementary Index |
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