The influence of calibration pattern coverage for lumped parameter resist models on OPC convergence.
| Autor: | Niehoff, Martin, Shang, Shumay, Toublan, Olivier |
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| Zdroj: | Proceedings of SPIE; Nov2006, Issue 1, p615619-615619-8, 8p |
| Databáze: | Complementary Index |
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