Development status of gas discharge produced plasma Z-pinch EUV sources for use in beta-tools and high volume chip manufacturing tools.
| Autor: | Stamm, U., Kleinschmidt, J., Gabel, K., Hergenhan, G., Ziener, C., Ahmad, I., Bolshukhin, D., Korobotchko, V., Keller, A., Geier, A., Ringling, J., Tran, C. D., Mader, B., de Bruijn, R., Gotze, S., Brudermann, J., Schriever, G. |
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| Zdroj: | Proceedings of SPIE; Nov2005, Issue 1, p829-839, 11p |
| Databáze: | Complementary Index |
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