Quartz etch process for alternating aperture phase shift masks (alt-APSM).
| Autor: | Srinivasan, Sunil, Westerman, Russ, Plumhoff, Jason, Johnson, Dave, Constantine, Chris |
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| Zdroj: | Proceedings of SPIE; Nov2005, Issue 1, p432-437, 6p |
| Databáze: | Complementary Index |
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