Predicting wafer-level IP error due to particle-induced EUVL reticle distortion during exposure chucking.
| Autor: | Ramaswamy, Vasu, Mikkelson, Andrew, Engelstad, Roxann, Lovell, Edward |
|---|---|
| Zdroj: | Proceedings of SPIE; Nov2005 Part 2, Issue 1, p59923T-59923T-7, 7p |
| Databáze: | Complementary Index |
| Externí odkaz: |
|