Solid-state NMR characterization of resist formulations for 193-nm lithography: chain dynamics and length scale of mixing.
| Autor: | Mirau, Peter A., Heffner, Sharon A., Rushkin, Ilya L., Houlihan, Francis M. |
|---|---|
| Zdroj: | Proceedings of SPIE; Nov2000, Issue 1, p104-111, 8p |
| Databáze: | Complementary Index |
| Externí odkaz: |
|