Improvement of the resolution and accuracy of chemical-amplification positive resist for 0.13-m reticle fabrication.
| Autor: | Arai, Tadashi, Sakamizu, Toshio, Kasuya, Kei, Katoh, Kohji, Soga, Takashi, Saitoh, Hidetaka, Shiraishi, Hiroshi, Hoga, Morihisa |
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| Zdroj: | Proceedings of SPIE; Nov2000 Part 2, Issue 1, p281-288, 8p |
| Databáze: | Complementary Index |
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