Mask critical dimension error on optical lithography.
| Autor: | Eom, Tae-Seung, Koo, Sang-Sool, Paek, Seung-Weon, Kim, Hee-Bom, Ahn, Chang-Nam, Baik, Ki-Ho |
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| Zdroj: | Proceedings of SPIE; Nov2000, Issue 1, p32-39, 8p |
| Databáze: | Complementary Index |
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