Polarized phase shift mask: concept, design, and potential advantages to photolithography process and physical design.
| Autor: | Wang, Ruoping, Grobman, Warren D., Reich, Alfred J., Thompson, Matthew A. |
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| Zdroj: | Proceedings of SPIE; Nov2002, Issue 1, p406-417, 12p |
| Databáze: | Complementary Index |
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