Complementary double-exposure technique (CODE): a way to print 80-nm gate level using a double-exposure binary mask approach.
| Autor: | Manakli, Serdar, Trouiller, Yorick, Toublan, Olivier, Schiavone, Patrick, Miramond, Corinne, Rody, Yves F., Sundermann, Frank, Chapon, J. D., Goirand, Pierre-Jerome |
|---|---|
| Zdroj: | Proceedings of SPIE; Nov2002, Issue 1, p491-502, 12p |
| Databáze: | Complementary Index |
| Externí odkaz: |
|