Chemical-amplification positive-resist design for 0.18-m reticle fabrication using the 50-kV HL-800M electron-beam system.
| Autor: | Arai, Tadashi, Sakamizu, Toshio, Soga, Takashi, Satoh, Hidetoshi, Katoh, Kohji, Shiraishi, Hiroshi, Hoga, Morihisa |
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| Zdroj: | Proceedings of SPIE; Nov1998, Issue 1, p190-195, 6p |
| Databáze: | Complementary Index |
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