The use of titanium and titanium dioxide as masks for deep silicon etching.
| Autor: | Powell, Olly J., Sweatman, Denis, Harrison, H. Barry |
|---|---|
| Zdroj: | Proceedings of SPIE; Nov2004, Issue 1, p26-35, 10p |
| Databáze: | Complementary Index |
| Externí odkaz: |
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| Autor: | Powell, Olly J., Sweatman, Denis, Harrison, H. Barry |
|---|---|
| Zdroj: | Proceedings of SPIE; Nov2004, Issue 1, p26-35, 10p |
| Databáze: | Complementary Index |
| Externí odkaz: |
|