Collimated laser-plasma lithography (CPL) for 90-nm and smaller contacts and vias.
| Autor: | Forber, Richard, Gaeta, Celestino, Siegert, Heinz, McLeod, Scott, Boerger, Brent E. |
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| Zdroj: | Proceedings of SPIE; Nov2004, Issue 1, p579-589, 11p |
| Databáze: | Complementary Index |
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