The dissolution behavior of tetrafluoroethylene-based fluoropolymers for 157-nm resist materials.
| Autor: | Ishikawa, Takuji, Kodani, Tetsuhiro, Koh, Meiten, Moriya, Tsukasa, Araki, Takayuki, Aoyama, Hirokazu, Yamashita, Tsuneo, Toriumi, Minoru, Hagiwara, Takuya, Furukawa, Takamitsu, Itani, Toshiro, Fujii, Kiyoshi |
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| Zdroj: | Proceedings of SPIE; Nov2004, Issue 1, p169-177, 9p |
| Databáze: | Complementary Index |
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