Precise x-ray mask writing technology using advanced 100-kV EB writer EB-X3.
| Autor: | Nakayama, Yoshinori, Watanabe, Hiroshi, Tsuboi, Shinji, Aoyama, Hajime, Ezaki, Mizunori, Matsui, Yasuji, Morosawa, Tetsuo, Oda, Masatoshi |
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| Zdroj: | Proceedings of SPIE; Nov2001, Issue 1, p650-659, 10p |
| Databáze: | Complementary Index |
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