Precision of noninvasive temperature measurement by diffuse reflectance spectroscopy.
Autor: | Pearsall, T.P., Saban, Stevan R., Booth, James, Beard, Barrett T., Johnson, S.R. |
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Zdroj: | Review of Scientific Instruments; Oct95, Vol. 66 Issue 10, p4977, 4p, 1 Diagram, 1 Chart, 3 Graphs |
Abstrakt: | Investigates the precision of noninvasive temperature by diffuse reflectance spectroscopy. Determining the temperature of Si and GaAs substrate during semiconductor processing; Standard deviation the noninvasive optical technique. |
Databáze: | Complementary Index |
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