Precision of noninvasive temperature measurement by diffuse reflectance spectroscopy.

Autor: Pearsall, T.P., Saban, Stevan R., Booth, James, Beard, Barrett T., Johnson, S.R.
Předmět:
Zdroj: Review of Scientific Instruments; Oct95, Vol. 66 Issue 10, p4977, 4p, 1 Diagram, 1 Chart, 3 Graphs
Abstrakt: Investigates the precision of noninvasive temperature by diffuse reflectance spectroscopy. Determining the temperature of Si and GaAs substrate during semiconductor processing; Standard deviation the noninvasive optical technique.
Databáze: Complementary Index