| Autor: |
Jian, L. K., Moser, H. O., Chen, A., Heussler, S. P., Liu, G., Mahmood, Shahrain bin, Kalaiselvi, S. M. P., Maniam, S. M., Virasawmy, Selven, Ren, Y. P., Barrett, M. D., Dhanapaul, A. L. |
| Předmět: |
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| Zdroj: |
AIP Conference Proceedings; 1/29/2009, Vol. 1092 Issue 1, p116-119, 4p, 2 Color Photographs, 1 Black and White Photograph, 3 Diagrams |
| Abstrakt: |
With its LiMiNT facility (Lithography for Micro- and Nanotechnology), Singapore Synchrotron Light Source (SSLS) provides a one-stop shop for micro/nano fabrication on large areas (typically 4” diameter). Synchrotron deep X-ray lithography, eventually enhanced by the super-resolution process, is used to simultaneously pattern large numbers of micro/nano structures into a resist. Laser direct writer or electron beam serve as primary pattern generators, in particular, for mask making. Structure heights of >1 mm, aspect ratios of >200, and minimum sizes of <200 nm have been achieved, not necessarily simultaneously. Such structures may be replicated into a variety of metals and plastics. Tilting, rotating of the mask-substrate stack during exposure enables the parallel production of nearly 3D structures. Application fields include electromagnetic metamaterials, X-ray and infrared optics, photonics, lasers, quantum technology, precision manufacturing, and fluidics. SSLS is serving a growing community of users and customers. [ABSTRACT FROM AUTHOR] |
| Databáze: |
Complementary Index |
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