Autor: |
Fallon[a], J. M., Faunce, C. A., Grundy[b], P. J. |
Předmět: |
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Zdroj: |
Journal of Applied Physics; 9/1/2000, Vol. 88 Issue 5, p2400, 8p, 5 Black and White Photographs, 8 Graphs |
Abstrakt: |
Presents the results of an investigation by transmission electron microscopy, electron diffraction, x-ray diffraction and x-ray reflectivity of sputter-deposited Co/Si multilayers. Retention of elemental regions in structures with individual layer thicknesses; Occurrence of significant intermixing with alloy formation through differentiation in multilayers below five nanometers. |
Databáze: |
Complementary Index |
Externí odkaz: |
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