Influence of melt depth in laser crystallized poly-Si thin film transistors.

Autor: Brotherton, S.D., McCulloch, D.J., Gowers, J. P., Ayres, J. R., Trainor, M. J.
Předmět:
Zdroj: Journal of Applied Physics; 10/15/1997, Vol. 82 Issue 8, p4086, 9p, 3 Black and White Photographs, 14 Graphs
Abstrakt: Investigates the influence of film thickness and incident excimer laser energy density on the properties of poly-Si thin film transistors. Effect of static irradiations using a semi-Gaussian laser beam; Effect mobilities for n- and p-channel TFT.
Databáze: Complementary Index