P‐208: Ultra High‐resolution patterning technology with Fine silicon mask.

Autor: Huang, Qingyu, Wang, Lu, Wang, Weijing, Liu, Xiaoyun, Zhang, Fengjie, Sun, Zhongyuan, Jiao, Zhiqiang, Yuan, Guangcai
Předmět:
Zdroj: SID Symposium Digest of Technical Papers; Jun2024, Vol. 55 Issue 1, p2173-2176, 4p
Abstrakt: Side by side RGB OLEDs‐on‐Silicon backplane holds great promise for high brightness, high resolution and low cost Micro OLED displays. The main challenge of vacuum thermal evaporation (VTE) patterning technique is to get a submricon‐size shadow distance. Herein, we have explored the relation of shadow distance with mask‐substrate gap, as well as the relationship of shadow distance with evaporation angle. The achievements verify the possibility of manufacturing the ultra‐high resolution side by side RGB AMOLEDs with >4000ppi. The study of ultra‐high resolution evaporation patterning need to be expanded for the OLED microdisplays futures. [ABSTRACT FROM AUTHOR]
Databáze: Complementary Index