Machine learning applications on 3nm node technology and designs for improving block-level PPA.

Autor: Shin, Hosoon, Ban, Yongchan, Kil, Jaebok, Hwang, Heecheol, Cho, Kyoungin, Sim, Sangmin, Lee, Bonghyun, Shin, Insub, Kim, Heeyeon, Jang, Chaeyoung
Zdroj: Proceedings of SPIE; 4/8/2023, Vol. 12495, p124951A-124951A-9, 1p
Databáze: Complementary Index